Low-Scatter Optical Thin Films by Bias RAS System
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چکیده
منابع مشابه
Structural, Electrical and Optical Properties of Molybdenum Oxide Thin Films Prepared by Post-annealing of Mo Thin Films
Molybdenum thin films with 50 and 150 nm thicknesses were deposited on silicon substrates, using DC magnetron sputtering system, then post-annealed at different temperatures (200, 325, 450, 575 and 700°C) with flow oxygen at 200 sccm (standard Cubic centimeter per minute). The crystallographic structure of the films was obtained by means of x-ray diffraction (XRD) analysis. An atomic force micr...
متن کاملStructural, Electrical and Optical Properties of Molybdenum Oxide Thin Films Prepared by Post-annealing of Mo Thin Films
Molybdenum thin films with 50 and 150 nm thicknesses were deposited on silicon substrates, using DC magnetron sputtering system, then post-annealed at different temperatures (200, 325, 450, 575 and 700°C) with flow oxygen at 200 sccm (standard Cubic centimeter per minute). The crystallographic structure of the films was obtained by means of x-ray diffraction (XRD) analysis. An atomic force micr...
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متن کاملstructural, electrical and optical properties of molybdenum oxide thin films prepared by post-annealing of mo thin films
molybdenum thin films with 50 and 150 nm thicknesses were deposited on silicon substrates, using dc magnetron sputtering system, then post-annealed at different temperatures (200, 325, 450, 575 and 700°c) with flow oxygen at 200 sccm (standard cubic centimeter per minute). the crystallographic structure of the films was obtained by means of x-ray diffraction (xrd) analysis. an atomic force micr...
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ژورنال
عنوان ژورنال: Journal of The Surface Finishing Society of Japan
سال: 2020
ISSN: 0915-1869,1884-3409
DOI: 10.4139/sfj.71.620